Wesely-1989

ModelingToolkit implementation of the surface (canopy) resistance to gaseous dry deposition from Seinfeld & Pandis (2006), Atmospheric Chemistry and Physics, 2nd ed., Chapter 19 (Dry Deposition), Eqs. 19.50-19.52 -- the Wesely (1989) resistance model. Computes the total surface resistance r_c [s/m] as four parallel deposition pathways (Eq. 19.50): the combined stomatal+mesophyll pathway, the cuticular/outer-surface pathway r_lu, the lower-canopy pathway r_dc+r_cl, and the ground pathway r_ac+r_gs. The stomatal resistance r_st (Eq. 19.51) responds to solar irradiance G and surface temperature T_s through dimensionless light and temperature factors; the mesophyll resistance r_m (Eq. 19.52) is set by the gas's effective Henry's-law solubility H_star and reactivity f_0. Migrated from AtmosphericDeposition.jl@e4468c79 src/seinfeld_pandis_ch19.jl:311 (the SurfaceResistance @component). Purely algebraic: no differential states, six explicit equations evaluated as a triangular cascade.