Surface-Resistance
- SurfaceResistance
model
atmospheric_deposition
sp_ch19
ModelingToolkit implementation of the surface (canopy) resistance to gaseous dry deposition from Seinfeld & Pandis (2006), Atmospheric Chemistry and Physics, 2nd ed., Chapter 19 (Dry Deposition), Eqs. 19.50-19.52 -- the Wesely (1989) resistance model. Computes the total surface resistance r_c [s/m] as four parallel deposition pathways (Eq. 19.50): the combined stomatal+mesophyll pathway, the cuticular/outer-surface pathway r_lu, the lower-canopy pathway r_dc+r_cl, and the ground pathway r_ac+r_gs. The stomatal resistance r_st (Eq. 19.51) responds to solar irradiance G and surface temperature T_s through dimensionless light and temperature factors; the mesophyll resistance r_m (Eq. 19.52) is set by the gas's effective Henry's-law solubility H_star and reactivity f_0. Migrated from AtmosphericDeposition.jl@e4468c79 src/seinfeld_pandis_ch19.jl:311 (the SurfaceResistance @component). Purely algebraic: no differential states, six explicit equations evaluated as a triangular cascade.
- WesleySurfaceResistance
model
atmospheric_deposition
wesley1989
Wesely (1989) bulk surface (canopy) resistance to gaseous dry deposition. Computes the total surface resistance r_c [s/m] along Wesely's three parallel mass-transfer pathways — the upper-canopy leaf cuticles, the lower-canopy structures, and the ground — from the gas species' Henry's-law solubility and reactivity, solar irradiation, surface air temperature, terrain slope, season, land-use category, and surface wetness (rain/dew). Migrated from AtmosphericDeposition.jl@e4468c79 src/wesley1989.jl:360 (the `WesleySurfaceResistance` builder function); implements Wesely (1989) Eq. 2 with the stomatal, mesophyll, cuticle, lower-canopy and ground sub-resistances of Eqs. 3-14 and the Walmsley & Wesely (1996) corrections.